CAS 71449-78-0

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Key Uses

  • Microlithography: The primary use of this compound is in the semiconductor industry for the production of integrated circuits. It is used in photoresists to generate acid upon exposure to ultraviolet light, which initiates the crosslinking or degradation of the photoresist, enabling the creation of fine patterns.
  • Microelectronic Fabrication: Beyond integrated circuits, this PAG is also used in the fabrication of other microelectronic devices such as sensors and microelectromechanical systems (MEMS).
  • Micropatterning: This compound is employed in various micropatterning applications, including the production of microfluidic devices and micro-optics.

Key Characteristics

    • Photoacid Generation: Upon exposure to UV light, this compound efficiently generates a strong Brønsted acid, typically hexafluoroantimonic acid. This acid acts as a catalyst, triggering chemical reactions in the photoresist.

<liHigh Sensitivity: This PAG exhibits high sensitivity to UV light, allowing for the creation of fine features with high resolution.

  • Good Thermal Stability: It has good thermal stability, which is important for high-temperature processing steps in semiconductor manufacturing.
  • Solubility: This compound is soluble in a variety of organic solvents, making it compatible with different photoresist formulations.

 

Category:

Description

Product Information
CAS number 71449-78-0
EC number 680-227-5
Empirical Formula C24H19F6S2Sb
Molecular Weight 607.29
Synonyms Sulfonium, diphenyl[4-(phenylthio)phenyl]-, (OC-6-11)-hexafluoroantimonate(1-) (1:1)
Structure formula Image Structure formula Image
Specifications
Assay 99%
Identity passes test
Storage and Shipping Information
Packaging and Shipping Packing: 20kg; delivery within 5-7 working days.
Storage Store in a dry, clean, well-ventilated warehouse. Avoid light and heat exposure. During transport, protect from leaks, rain, and direct sunlight.

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