CAS 71449-78-0

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Key Uses

• Microlithography: The primary use of this compound is in the semiconductor industry for the production of integrated circuits. It is used in photoresists to generate acid upon exposure to ultraviolet light, which initiates the crosslinking or degradation of the photoresist, enabling the creation of fine patterns.
• Microelectronic Fabrication: Beyond integrated circuits, this PAG is also used in the fabrication of other microelectronic devices such as sensors and microelectromechanical systems (MEMS).
• Micropatterning: This compound is employed in various micropatterning applications, including the production of microfluidic devices and micro-optics.

Key Characteristics

• Photoacid Generation: Upon exposure to UV light, this compound efficiently generates a strong Brønsted acid, typically hexafluoroantimonic acid. This acid acts as a catalyst, triggering chemical reactions in the photoresist.
High Sensitivity: This PAG exhibits high sensitivity to UV light, allowing for the creation of fine features with high resolution.
• Good Thermal Stability: It has good thermal stability, which is important for high-temperature processing steps in semiconductor manufacturing.
• Solubility: This compound is soluble in a variety of organic solvents, making it compatible with different photoresist formulations.